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Overview<\/strong><\/p><p>1.1 Application: the semi-automatic single-wafer cleaner is high-cleanliness cleaning equipment with chemical cleaning, high-speed spin drying and fast baking. Different wafer sizes are handled by quick spin-head replacement. Mainly for brushing and drying of 4-12 inch semiconductor wafers, masks and various substrates - cost-effective and production-ready.<\/p><p>1.2 Name: Semi-Automatic Single-Wafer Cleaner<\/p><p>1.3 Model: SQX-150-5Y1D<\/p><p><strong>2. Main Structure<\/strong><\/p><p>Mainly consists of servo motor, chemical supply system, PLC controller, high-cleanliness valves and PFA tubing.<\/p><p>2.1 Material: imported PP sheet, cleanroom compatible.<\/p><p>2.2 Dedicated servo motor: 5-5000 RPM, low-speed uniform cleaning, high-speed centrifugal drying.<\/p><p>2.3 Industrial PLC controller with HMI for stable control and intuitive operation.<\/p>","_zk_en_specs":"<tr><th>Wafer Size<\/th><td>2, 3, 4, 6 inch wafers<\/td><\/tr><tr><th>Wafers per Cycle<\/th><td>1<\/td><\/tr><tr><th>Stations<\/th><td>1<\/td><\/tr><tr><th>Loading<\/th><td>Manual<\/td><\/tr><tr><th>Rotation Speed RPM\/MIN<\/th><td>5-5000 rpm settable<\/td><\/tr><tr><th>Cleaning<\/th><td>Chemical \/ megasonic \/ two-fluid \/ DIW<\/td><\/tr><tr><th>Chemical Types<\/th><td>5<\/td><\/tr><tr><th>Nozzles<\/th><td>Independent top &amp; bottom supply<\/td><\/tr><tr><th>Chemical Tanks<\/th><td>5 x 10L PVDF<\/td><\/tr><tr><th>Chemicals Supported<\/th><td>Cold sulfuric, hot sulfuric, SC1, alcohol, acetone, IPA, NMP, KOH<\/td><\/tr><tr><th>Chemical Heating<\/th><td>1 (hot sulfuric)<\/td><\/tr><tr><th>Supply Method<\/th><td>Pressure control<\/td><\/tr><tr><th>Outlet Size<\/th><td>Front 5 x OD4mm\/ID2mm, Back 5 x OD4mm\/ID2mm<\/td><\/tr><tr><th>Chemical Flow Control<\/th><td>10 x PFA manual valve 10-1000ml\/min<\/td><\/tr><tr><th>Chemical Flow Monitoring<\/th><td>5 front + 5 back<\/td><\/tr><tr><th>DIW Rinse<\/th><td>2 lines<\/td><\/tr><tr><th>DIW Flow Control<\/th><td>2 x PFA manual valve 10-1000ml\/min<\/td><\/tr><tr><th>DIW Outlet<\/th><td>2 x OD4mm\/ID2mm front &amp; back<\/td><\/tr><tr><th>Water Flow Monitoring<\/th><td>1 front + 1 back<\/td><\/tr><tr><th>Megasonic Rinse<\/th><td>1 front<\/td><\/tr><tr><th>Megasonic Flow Control<\/th><td>1 x PFA manual valve 100-2000ml\/min<\/td><\/tr><tr><th>Two-Fluid Cleaning<\/th><td>1 front<\/td><\/tr><tr><th>Two-Fluid Flow Control<\/th><td>1 x PFA manual valve 100-2000ml\/min<\/td><\/tr><tr><th>Cycle Time<\/th><td>2-5 min<\/td><\/tr><tr><th>N2 Pressure<\/th><td>0.15MPa, port 1\/4 inch<\/td><\/tr><tr><th>DIW Pressure<\/th><td>0.15MPa, port 1\/4 inch<\/td><\/tr><tr><th>Drain<\/th><td>2 x phi19mm (water\/chemical)<\/td><\/tr><tr><th>Exhaust<\/th><td>2 x 110mm\/75mm<\/td><\/tr><tr><th>Display\/Control<\/th><td>7 inch touch screen + PLC<\/td><\/tr><tr><th>Piping<\/th><td>PFA<\/td><\/tr><tr><th>Power<\/th><td>220V<\/td><\/tr><tr><th>Power Rating<\/th><td>5KW<\/td><\/tr><tr><th>Dimensions<\/th><td>L660 x W760 x H1332mm<\/td><\/tr>","_zk_en_keywords":"Two-Fluid Wafer Cleaner,Reticle Cleaner,Photomask Cleaner,Wafer Resist Removal Cleaner,Wafer Cleaning Machine","_zk_en_excerpt":"Two-fluid wafer cleaning machine, reticle cleaner, photomask cleaner and wafer resist-removal cleaner: high-pressure gas-liquid spray removes nano particles, wet chemical stripping of photoresist, non-destructive cleaning of masks and patterns, for 4-12 inch wafers and compound substrates."},"product_cat":[4],"class_list":["post-16","product","type-product","status-publish","hentry","product_cat-4"],"_links":{"self":[{"href":"https:\/\/zkmsemi.com\/index.php?rest_route=\/wp\/v2\/product\/16","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/zkmsemi.com\/index.php?rest_route=\/wp\/v2\/product"}],"about":[{"href":"https:\/\/zkmsemi.com\/index.php?rest_route=\/wp\/v2\/types\/product"}],"wp:attachment":[{"href":"https:\/\/zkmsemi.com\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=16"}],"wp:term":[{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/zkmsemi.com\/index.php?rest_route=%2Fwp%2Fv2%2Fproduct_cat&post=16"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}