Single-Wafer Cleaner & Spin Dryer (12/8 inch)
1. Overview
The single-wafer spin dryer is high-cleanliness drying equipment featuring high-speed spin drying and fast baking. Different wafer sizes are handled by quick spin-head replacement. As a key tool in the wet-cleaning process, it is compact and stable, mainly for cleaning & drying of 2-8 inch semiconductor wafers, masks and various substrates - cost-effective and production-ready.
2. Main Structure
The single-wafer cleaner & dryer mainly consists of servo motor, PLC controller, HMI, high-cleanliness valves, PFA tubing, nitrogen heater, corrosion-resistant housing and spin head.
2.1 Material: imported PP sheet, suitable for cleanroom environment;
2.2 Dedicated servo motor: 10-5000 RPM, low-speed uniform cleaning and high-speed centrifugal drying;
2.3 Industrial PLC controller with HMI for stable, reliable control and intuitive operation;
2.4 Spin heads customizable for different wafer sizes.
| Equipment | Single-Wafer Cleaner & Spin Dryer |
|---|---|
| Model | QSG-300 |
| Wafer Size | 2-8 inch wafers, masks, various substrates |
| Material | Imported PP sheet, cleanroom compatible |
| Rotation Speed | 10-5000 RPM (servo), low-speed clean / high-speed dry |
| Control System | Industrial PLC + HMI |
| Spin Head | Customizable for different sizes |
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