Products
Crystal Growth Equipment
VGF Single Crystal Furnace (Crystal Growth Furnace)
VGF single crystal furnace adopts vertical gradient freezing (VGF) technology, mainly for growth of 2-6 inch Ge single crystals, GaAs, CdZnTe and other compound crystals.
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Drying Equipment
Semitool SRD Spin Dryer (Dual Chamber)
Wafer spin dryer is a high-cleanliness rinse & dry tool featuring high-purity rinse, high-speed spin drying and fast baking. Different wafer sizes are handled by quick rotor replacement. Available in single- and dual-chamber designs - compact and stable - mainly for high-cleanliness rinse and drying of 2-8 inch semiconductor wafers, masks and various substrates.
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Cleaning Equipment
Contactless Wafer Unloader
Contactless wafer unloader (XP-8) is designed to unload polished wafers from ceramic plates without contact, supporting 2-6 inch wafers. Dimensions: L1190 x W600 x H1120mm.
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Crystal Growth Equipment
Poly-Crystal Furnace (Crystal Growth Furnace)
Crystal material growth equipment supporting VGF, HB, HGF and VB processes for GaAs and other compound crystals, 2-6 inch, vertical/horizontal structures, gradient and moving growth modes.
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Processing Equipment
Meyer Burger ID Saw (TS23 Refurbished)
This is a refurbished Meyer Burger TS23 ID saw. Electrical system fully replaced with industrial PLC and touch-screen control; mechanical system maintained to required precision; lift and feed upgraded to ball-screw guides.
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Cleaning Equipment
Wafer Unloading Station (QDR Cleaning Station)
Wafer unloading station (QDR cleaning station) for wafer polishing unloading and cleaning, integrating shower, water gun, QDR tank and overflow purification.
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Drying Equipment
Single-Wafer Cleaner & Spin Dryer (12/8 inch)
Single-wafer spin dryer (QSG-300) is a high-cleanliness drying tool with high-speed spin drying and fast baking; wafer sizes are changed by quick spin-head replacement. For 2-8 inch wafers, masks and substrates.
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Processing Equipment
Manual Wafer Edge Grinder
The wafer edge grinder is a precision semiconductor tool for accurate edge chamfering of silicon, SiC or sapphire wafers, removing burrs and sharp edges, improving edge quality, yield and safety.
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Purification Equipment
Multi-Function Clean Cleaning Station (FFU Purification Bench)
Multi-function clean cleaning station (FFU bench) integrates efficient purified air supply and cleaning operations for semiconductor wafer and optoelectronic device cleaning, inspection and purification.
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Cleaning Equipment
Fully Automatic Single-Wafer Cleaning Machine
Fully automatic single-wafer cleaning machine adopts advanced cleaning technology and automated control to clean each wafer efficiently and precisely in a dust-free environment - wafer transfer, chemical supply, UPW rinse and drying systems integrated.
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Cleaning Equipment
Manual Single-Wafer Cleaner & Spin Dryer
Manual single-wafer cleaner & dryer (QXG-300-2YDN) is a high-cleanliness cleaning & drying tool with high-speed spin drying, fast baking and high efficiency, compatible with 2-4 inch wafers, masks and substrates.
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Drying Equipment
Wafer Spin Dryer (6/8 inch)
Wafer spin dryer is high-cleanliness rinse & dry equipment with high-purity rinse, high-speed drying and fast baking; quick rotor change for different wafer sizes - a key wet-cleaning tool.
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Drying Equipment
Single-Wafer Spin Dryer
Single-wafer spin dryer (DP-4) is high-cleanliness cleaning & drying equipment with high-speed drying and fast baking; quick spin-head change for different wafer sizes. For 2-4 inch wafers, masks and substrates.
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Auxiliary Tools
Waterproof Vacuum Tweezers (Wafer Vacuum Pen)
Corrosion-resistant vacuum tweezers designed for wafer wet-cleaning processes - water, acid, alkali and solvent resistant, PTFE dust-free material, non-destructive pick-up of single wafers and InP/GaAs substrates, suitable for cleaner loading/unloading, with customizable tip options.
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Cleaning Equipment
Two-Fluid Wafer Cleaning Machine
Two-fluid wafer cleaning machine, reticle cleaner, photomask cleaner and wafer resist-removal cleaner: high-pressure gas-liquid spray removes nano particles, wet chemical stripping of photoresist, non-destructive cleaning of masks and patterns, for 4-12 inch wafers and compound substrates.
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Inspection Equipment
Imported Wafer Inspection Lamp (Wafer Detection Light)
QG-150/QG-250 inspection light source for surface defect inspection of Si, GaAs, Ge, glass and more - even tiny defects are detectable. For wafer appearance inspection to quickly identify particles, scratches and stains.
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Drying Equipment
EFEM Cleaner & Spin Dryer
SG-8-12-2D EFEM cleaner & spin dryer, designed for integration with the Equipment Front End Module (EFEM), supporting automatic wafer loading/unloading and SECS-GEM communication, high-speed centrifugal drying + double-side N2 hot-air drying for 2-12 inch wafers.
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Cleaning Equipment
InP Wafer Cleaning Machine (Semi-Auto Single-Wafer Cleaner)
Semi-automatic single-wafer cleaner (SQX-150-5Y1D) is high-cleanliness cleaning equipment with chemical cleaning, high-speed spin drying and fast baking, compatible with 4-12 inch wafers, masks and substrates.
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