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InP Wafer Cleaning Machine (Semi-Auto Single-Wafer Cleaner)

InP Wafer Cleaning Machine (Semi-Auto Single-Wafer Cleaner)
Cleaning Equipment

InP Wafer Cleaning Machine (Semi-Auto Single-Wafer Cleaner)

Semi-automatic single-wafer cleaner (SQX-150-5Y1D) is high-cleanliness cleaning equipment with chemical cleaning, high-speed spin drying and fast baking, compatible with 4-12 inch wafers, masks and substrates.
InP Wafer Cleaner,InP Single-Wafer Cleaner Dryer,InP Substrate Cleaner,InP Double-Side Cleaner Dryer
01Product Details

1. Overview

1.1 Application: the semi-automatic single-wafer cleaner is high-cleanliness cleaning equipment with chemical cleaning, high-speed spin drying and fast baking. Different wafer sizes are handled by quick spin-head replacement. Mainly for brushing and drying of 4-12 inch semiconductor wafers, masks and various substrates - cost-effective and production-ready.

1.2 Name: InP Semi-Automatic Single-Wafer Cleaner

1.3 Model: SQX-150-5Y1D

2. Main Structure

Mainly consists of servo motor, chemical supply system, PLC controller, high-cleanliness valves and PFA tubing.

2.1 Material: imported PP sheet, cleanroom compatible.

2.2 Dedicated servo motor: 5-5000 RPM, low-speed uniform cleaning, high-speed centrifugal drying.

2.3 Industrial PLC controller with HMI for stable control and intuitive operation.

02Technical Specifications
Wafer Size2, 3, 4, 6 inch wafers
Wafers per Cycle1
Stations1
LoadingManual
Rotation Speed RPM/MIN5-5000 rpm settable
CleaningChemical / megasonic / DIW
Chemical Types5
NozzlesIndependent top & bottom supply
Chemical Tanks5 x 10L PVDF
Chemicals SupportedCold sulfuric, hot sulfuric, SC1, alcohol, acidic chemicals
Chemical Heating1 (hot sulfuric)
Supply MethodPressure control
Outlet SizeFront 5 x OD4mm/ID2mm, Back 5 x OD4mm/ID2mm
Chemical Flow Control10 x PFA manual valve 10-1000ml/min
Chemical Flow Monitoring4 front + 4 back
DIW Rinse2 lines
DIW Flow Control2 x PFA manual valve 10-1000ml/min
DIW Outlet2 x OD4mm/ID2mm front & back
Water Flow Monitoring1 front + 1 back
Megasonic Rinse1 line
Megasonic Flow Control1 x PFA manual valve 10-1000ml/min
ExternalHigh-pressure water gun x 1
Cycle Time2-5 min
N2 Pressure0.15MPa, port 1/4 inch
DIW Pressure0.3MPa, port 3/8 inch
Drain2 x phi19mm (water/chemical)
Exhaust2 x 110mm/75mm
Display/Control7 inch touch screen + PLC
External CommunicationTCP interface collects equipment data: flow, temperature, speed, airflow
PipingPFA
Power220V
Power Rating5KW
DimensionsL660 x W760 x H1332mm

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