Two-Fluid Wafer Cleaning Machine

1. Overview

1.1 Application: the semi-automatic single-wafer cleaner is high-cleanliness cleaning equipment with chemical cleaning, high-speed spin drying and fast baking. Different wafer sizes are handled by quick spin-head replacement. Mainly for brushing and drying of 4-12 inch semiconductor wafers, masks and various substrates - cost-effective and production-ready.

1.2 Name: Semi-Automatic Single-Wafer Cleaner

1.3 Model: SQX-150-5Y1D

2. Main Structure

Mainly consists of servo motor, chemical supply system, PLC controller, high-cleanliness valves and PFA tubing.

2.1 Material: imported PP sheet, cleanroom compatible.

2.2 Dedicated servo motor: 5-5000 RPM, low-speed uniform cleaning, high-speed centrifugal drying.

2.3 Industrial PLC controller with HMI for stable control and intuitive operation.