Cleaning Equipment
Wafer Unloading Station (QDR Cleaning Station)
Wafer unloading station (QDR cleaning station) for wafer polishing unloading and cleaning, integrating shower, water gun, QDR tank and overflow purification.
01Product Details
The wafer unloading station (QDR cleaning station) is used for polished-wafer unloading and cleaning, integrating shower, water gun, QDR tank and overflow purification functions.
Layout
1. Shower on the left, water gun on the right;
2. QDR configured with a small support when used for 4-inch wafers;
3. CASS overflow at 2cm below the full water level;
4. Overflow is valve-controlled, with a flow meter installed for direct visual flow adjustment.
Main Structure
The contactless wafer unloader mainly consists of spindle rotation, cassette fixture, process chamber, frame, door, QDR tank, clean piping and electrical control.
02Technical Specifications
| Function | Wafer unloading station / QDR cleaning station |
|---|---|
| Layout | Shower left, water gun right |
| QDR Configuration | Small support for 4-inch use |
| Overflow | CASS overflow 2cm below full level, valve controlled |
| Flow Monitoring | Flow meter for direct visible adjustment |
| Components | Spindle, cassette fixture, chamber, frame, door, QDR tank, clean piping, electrical control |
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