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Poly-Crystal Furnace (Crystal Growth Furnace)

Poly-Crystal Furnace (Crystal Growth Furnace)
Crystal Growth Equipment

Poly-Crystal Furnace (Crystal Growth Furnace)

Crystal material growth equipment supporting VGF, HB, HGF and VB processes for GaAs and other compound crystals, 2-6 inch, vertical/horizontal structures, gradient and moving growth modes.
Poly Crystal Furnace,Poly Crystal Growth Furnace,GaAs Poly Synthesis Furnace,Compound Crystal Growth Furnace,VB Crystal Growth Furnace
01Product Details

1. Overview

1.1 Application: crystal material growth equipment.

1.2 VGF / HB / HGF / VB features:
1.2.1 For growth of GaAs and other compound crystals;
1.2.2 Structure: vertical growth / horizontal growth;
1.2.3 Growth mode: gradient growth and moving growth.

1.3 Crystal growth size: 2-6 inch
1.4 Equipment types: HB, HGF, VGF, VB

2. Key Specifications

For III-V and II-VI compound semiconductor crystal film growth, meeting compound semiconductor device production and R&D processes; single-tube horizontal heating furnace, movable left/right; crystal sizes customizable.

02Technical Specifications
ApplicationCrystal material growth equipment
MaterialsIII-V, II-VI compound semiconductors (GaAs etc.)
Crystal Size2-6 inch
TypesHB, HGF, VGF, VB
StructureVertical / Horizontal growth
Growth ModeGradient growth & moving growth
FurnaceSingle-tube horizontal, movable left/right
CrystalCustomizable

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