Drying Equipment
Semitool SRD Spin Dryer (Dual Chamber)
Wafer spin dryer is a high-cleanliness rinse & dry tool featuring high-purity rinse, high-speed spin drying and fast baking. Different wafer sizes are handled by quick rotor replacement. Available in single- and dual-chamber designs - compact and stable - mainly for high-cleanliness rinse and drying of 2-8 inch semiconductor wafers, masks and various substrates.
01Product Details
1. Overview
The wafer spin dryer is high-cleanliness rinsing and drying equipment featuring high-purity rinse, high-speed spin drying and fast baking. Different wafer sizes are handled by quick rotor replacement. As a key tool in the wet-cleaning process, it is available in single-chamber and dual-chamber configurations - compact and stable - mainly for high-cleanliness rinse and drying of 2-8 inch semiconductor wafers, masks and various substrates.
2. Key Specifications
Model: Semitool 870S (Dual Chamber)
Rotation Speed: 200-2200 RPM/MIN
Wafer Size: 2-8 inch
02Technical Specifications
| Model | Semitool 870S (Dual Chamber) |
|---|---|
| Wafer Size | 2-8 inch |
| Rotation Speed | 200-2200 RPM/MIN |
| Structure | Single chamber / Dual chamber |
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